Fabrication and characterization of cmos-mems magnetic microsensors

HIGHLIGHTS

  • who: Chen-Hsuan Hsieh and colleagues from the Department of Mechanical Engineering, National Chung Hsing University, Taichung, Taiwan have published the research: Fabrication and Characterization of CMOS-MEMS Magnetic Microsensors, in the Journal: Sensors 2013, 13, 14728-14739 of 13/09/2013
  • what: This study investigates the design and fabrication of using the commercial 0.35 μm complementary metal oxide semiconductor (CMOS) process. The authors develop a magnetic sensor integrated with a sensing circuit.
  • how: In this investigation a current of 40 mA is used. The results showed that the output voltage of . . .

     

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