HIGHLIGHTS
- Who: Somtochukwu Anonyuo from the Intel Corporation, Rio-Rancho New Mexico, USA have published the article: A review of quality control and process optimization in high-volume semiconductor manufacturing, in the Journal: (JOURNAL)
- Future: And Future Research This review highlights the importance of quality_control and process optimization in high-volume semiconductor manufacturing underscoring the benefits of both traditional and AI-driven methods. The review also proposes future research avenues focusing the integration of adaptive AI models and data governance practices to meet evolving industry challenges and regulatory requirements. Future research should focus on developing more . . .
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