Model of diffusion-assisted direct laser writing by means of nanopolymerization in the presence of radical quencher

HIGHLIGHTS

• who: Alexander Pikulin et al. from the InstitutSvyatoozerskaya St, Shatura Moscow Region, Russia have published the research work: Model of diffusion-assisted direct laser writing by means of nanopolymerization in the presence of radical quencher, in the Journal: (JOURNAL) of 17/Dec/2015
• what: In this paper, a theoretical model of DA-DLW was developed. The model addresses the radical polymerization process19,20 initiated by a focused laser beam in a resin, where the diffusing radical quencher (the polymerization inhibitor) is present. Similar to the model presented above, two polymerization regimes are possible. The models . . .
  

   

  

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