HIGHLIGHTS
- who: Nicolas Lafitte et al. from the The authors would like to thank AW. Coleman from the University of Lyon, Lyon, France, for the discussion and proofreading of the text. The photolithography masks were fabricated with the, inch EB writer, +, donated by Advantest Corporation to the VLSI Design and Education Center (the University of Tokyo). have published the article: Improvement of Silicon Nanotweezers Sensitivity for Mechanical Characterization of Biomolecules Using Closed-Loop Control, in the Journal: (JOURNAL)
- what: -In this paper the authors show that closed-loop control can be advantageously used for the characterization . . .
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