HIGHLIGHTS
- who: Ketene Acetals from the (UNIVERSITY) have published the paper: Novel, High‐Resolution, Subtractive Photoresist Formulations for 3D Direct Laser Writing Based on Cyclic Ketene Acetals, in the Journal: (JOURNAL)
- what: The authors report the use of 2-methylene-1,3-dioxepane (MDO), one of the most stable and readily available CKAs, as additive in commercial acrylate-based photoresists (such as IP-L) or in combination with common acrylate crosslinkers (such as pentaerythritol tetraacrylate, PETA, and polyethylene glycol diacrylate, PEG-DA) as novel photoresist formulations for the preparation of degradable poly(ester-co-acrylate) Adv . . .
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