HIGHLIGHTS
- who: Benjamin Leuschel from the (UNIVERSITY) have published the Article: Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly, in the Journal: (JOURNAL) of 29/01/2018
- what: The aim of this paper is to report on recent works conducted by the research team in the framework of directed self-assembly using DUV laser patterning. As a final goal, the authors aim to show that this approach is suitable for DSA of several types of objects, such as block copolymers, nanoparticles or liquids. The choice of DUV laser irradiation (an . . .
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