HIGHLIGHTS
- who: AurĂ©lien Sarrazin et al. from the CEA, rue de la Houssiniè€re, Nantes, France have published the paper: Block copolymer selectivity: A new dry etch approach for cylindrical applications, in the Journal: (JOURNAL) of 12/07/2018
- what: The authors propose to study CO and CO-H2 cycles as a solution to remove PMMA selectively to PS.
- how: This result is in good agreement with a previous study showing an increase in the CD after CO-H2 chemistry as a function of the process time .
SUMMARY
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