Growth mechanism and film properties of atomic-layer-deposited titanium oxysulfide

HIGHLIGHTS

• who: Jeroen G. A. van Kasteren et al. from the Jeroen GA. van Kasteren, Department of Applied Physics, Eindhoven University of Technology, MB Eindhoven, The Netherlands Saravana B. Basuvalingam, Department of Applied Physics, Eindhoven University of Technology, MB Eindhoven, The Netherlands have published the paper: Growth Mechanism and Film Properties of Atomic-Layer-Deposited Titanium Oxysulfide, in the Journal: (JOURNAL) of August/22,/2022
• what: Altogether, this work shows that ALD is a viable method for the controlled synthesis of TiOxSy and provides insights into important aspects that must be considered when tailoring the film . . .
  

   

  

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