Metallic on-chip light concentrators fabricated by in situ plasmonic etching technique

HIGHLIGHTS

• who: Lihua Cha and Pan Li from the School of Law, Central University of Finance and Economics, Beijing, China have published the Article: Metallic On-Chip Light Concentrators Fabricated by In Situ Plasmonic Etching Technique, in the Journal: Nanomaterials 2022, 4195 of /2022/
• what: The authors propose that the PICS effect can be utilized to achieve Ag nanowires (NWs) etching. By changing the excitation polarizations, the authors show that the morphological changes of the NWs are mainly induced by the plasmonic enhanced near field on the NWs.
• how: In the experiments the authors . . .
  

   

  

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