HIGHLIGHTS
- who: Jacob M. Wall and Feng Yan from the Department of Metallurgical and Materials Engineering, The University of Alabama, Tuscaloosa, AL, USA have published the Article: Sputtering Process of ScxAl1-xN Thin Films for Ferroelectric Applications, in the Journal: Coatings 2023, 13, x FOR PEER REVIEW of /2023/
- what: Although it is not possible to conclusively say what the ideal target design sputtering atmosphere sputtering power and substrate temperature should be for all sputtering processes the goal of this paper is to analyze the impacts of the various sputtering parameters in detail and provide some . . .
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