HIGHLIGHTS
- who: Chang-Ming Wang and collaborators from the Department of Chemistry, National Taiwan University, Taipei , have published the article: Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning, in the Journal: (JOURNAL)
- what: Taking advantage of the diffusion-free CLL operation, here the authors demonstrate a straightforward method to generate unique chemical patterns by spontaneous structural gaps creation and further push CLL resolution to a new limit (Scheme 1A). The authors demonstrate a straightforward method to reliably produce surface features that are orders of magnitude smaller than the original stamp structures.
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