Control of morphology and substrate etching in inas/inp droplet epitaxy quantum dots for single and entangled photon emitters

HIGHLIGHTS

• who: Gajjela et al. from the Elisa Maddalena Sala, EPSRC National Epitaxy Facility, The University of Sheffield, HQ Sheffield, United , have published the research: Control of morphology and substrate etching in InAs/InP droplet epitaxy quantum dots for single and entangled photon emitters, in the Journal: (JOURNAL) of May/30,/2022
• what: The authors show for the first time the formation of trenches and long-range etching in QDs with atomic resolution. In Figure 2, the authors provide the height versus base the center of the etched region. The authors show that both etching processes . . .
  

   

  

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