Investigation into sio2 etching characteristics using fluorocarbon capacitively coupled plasmas: etching with radical/ion flux-controlled

HIGHLIGHTS

• who: Won-nyoung Jeong and collaborators from the Department of Physics, Chungnam National University, Daejeon, Republic of Korea have published the Article: Investigation into SiO2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled, in the Journal: Nanomaterials 2022, 12, x FOR PEER REVIEW of /2022/
• what: The authors investigated plasma etching characteristics under discharge condiinternal parameters, which dominate the etching diagnostics areas necessary. tions through cross-section morphology measurement of results, etchedplasma samples as well there are fewvarious works comprising etching in tandem with internal plasma parametersHowever, measured through techniques . . .
  

   

  

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