Atomic layer deposition of large-area polycrystalline transition metal dichalcogenides from 100 °c through control of plasma chemistry

HIGHLIGHTS

• who: Miika Mattinen and colleagues from the (UNIVERSITY) have published the article: Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100 u00b0C through Control of Plasma Chemistry, in the Journal: (JOURNAL) of April/15,/2022
• what: The authors demonstrate deposition of polycrystalline wafer-scale MoS2 TiS2 and WS2 films of controlled thickness at record-low temperatures to u00b0C using plasma-enhanced atomic layer deposition. The authors show that preventing excess sulfur incorporation from H2S-based plasma is the key to deposition of crystalline films which can be achieved by adding H2 to . . .
  

   

  

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