HIGHLIGHTS
- who: Mayara L. Goiana and Fabiano A. N. Fernandes from the Departamento de Engenharia Quu00edmica, Universidade Federal do Cearu00e1, Campus do Pici have published the paper: Influence of Dielectric Barrier Discharge Plasma Treatment on Corn Starch Properties, in the : Processes 2023, 11, 1966. of /2023/
- what: This study evaluated the effects of dielectric barrier discharge (DBD) plasma technology on some physicochemical and structural properties of corn starch. Longer processing times (>20 min) were not tested in this work because previous studies from the group indicated that no changes were obtained after 30 min of plasma . . .
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