HIGHLIGHTS
- who: M. F. DeCamp and colleagues from the Department University of Delaware, Newark, Delaware, USA have published the article: Dynamic strain evolution in an optically excited Pt thin film, in the Journal: (JOURNAL)
- what: The interest in TRXRD studies of irreversible processes, in general,13 and the practical importance of gaining a better understanding of irreversible thin film stress relaxation, in particular, provided the primary motivation for the work described in this article.
SUMMARY
A single crystal Si wafer with a 1 μm thick amorphous silicon oxide surface layer was used . . .
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