HIGHLIGHTS
- who: Jong-Hyeon Shin and collaborators from the Institutional Review Board Statement: Not applicableInformed Consent Statement: Not applicable. have published the paper: A Study on the Characteristics of Inductively Coupled Plasma Nitridation Process, in the Journal: Coatings 2022, 1372 of /2022/
- what: The authors investigated the of silicon oxide film surfaces using an inductively coupled plasma source.
SUMMARY
Plasma nitriding is a useful technique for altering the surface properties of materials. The ultrathin SiO2 layer causes the following problems: the tunneling currents increase exponentially as the SiO2 thickness decreases further than . . .
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