HIGHLIGHTS
SUMMARY
Residual stress brought about by the process will also affect the piezoresistive coefficient of the silicon wafer. By directly measuring the piezoresistive coefficient on-chip, the distribution of the piezoresistive coefficient on the wafer can be obtained, which is also important to guide the fine-tuning and consistency of the process parameters of the bulk silicon piezoresistance process and predict the sensitivity of piezoresistive devices more precisely. In p-type silicon, the piezoresistive effect is mainly described by the shear coefficient π 44, which is also the most often considered piezoresistive coefficient of MEMS piezoresistive . . .
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