Comparison of self-assembled monolayers using 3-aminopropyltrimethoxysilane and decyltrimethoxysilane in vapor phase for porous sioch dielectrics

HIGHLIGHTS

• who: Yi-Lung Cheng et al. from the Department of Electrical Engineering, National Chi-Nan University, Nan-Tou, Taiwan have published the paper: Comparison of Self-Assembled Monolayers Using 3-Aminopropyltrimethoxysilane and Decyltrimethoxysilane in Vapor Phase for Porous SiOCH Dielectrics, in the Journal: Coatings 2023, 507 of /2023/
• what: In this study, the formation of SAMs at the surface of p-SiCOH films is investigated.
• how: Experimental results indicated that both SAMs derived from APTMS and DTMOS enhanced the breakdown field and time-dependent dielectric breakdown provided Cu barrier capacity and promoted adhesion . . .
  

   

  

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