Deposition mechanism and characterization of plasma-enhanced atomic layer-deposited snox films at different substrate temperatures

HIGHLIGHTS

  • who: Pao-Hsun Huang and collaborators from the School of Ocean Information Engineering, Jimei University, Jimei District, Xiamen, China have published the Article: Deposition Mechanism and Characterization of Plasma-Enhanced Atomic Layer-Deposited SnOx Films at Different Substrate Temperatures, in the Journal: Nanomaterials 2022, 12, x FOR PEER REVIEW of /2022/
  • what: In this work, PEALD SnOx films were prepared at various substrate temperatures, and their optical, physical, and chemical properties were further studied.
  • how: In this work PEALD SnOx films were prepared at various substrate temperatures and their optical physical and chemical . . .

     

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