Dielectric breakdown in hfo2 dielectrics: using multiscale modeling to identify the critical physical processes involved in oxide degradation

HIGHLIGHTS

• who: Jack Strand et al. from the Department of Physics and Astronomy, University College London, Gower Street, London WC E BT, United Kingdom have published the Article: Dielectric breakdown in HfO2 dielectrics: Using multiscale modeling to identify the critical physical processes involved in oxide degradation, in the Journal: (JOURNAL)
• what: The authors focus on the role played by electron injection in the creation of oxygen vacancies which eventually form the percolation path responsible for dielectric breakdown. The authors demonstrate that both the characteristic breakdown times and the range of observed TDDB statistics for HfO2 are . . .
  

   

  

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