Effects of fumed silica on thixotropic behavior and processing window by uv-assisted direct ink writing

HIGHLIGHTS

  • who: Fengze Jiang et al. from the Institute of Polymer Technology (LKT), Friedrich-Alexander-University Erlangen-Nuremberg have published the paper: Effects of Fumed Silica on Thixotropic Behavior and Processing Window by UV-Assisted Direct Ink Writing, in the Journal: Polymers 2022, 3107 of /2022/
  • what: In this paper, the effects of thixotropy agent amount on the printability of the UV-DIW were discussed.
  • how: To begin with the pristine oligomer and monomer resin without FS were tested for th shear thinning effects.
  • future: In the presence of UV light the . . .

     

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