HIGHLIGHTS
- who: Attention Mechanism and collaborators from the School of Computer Science and Technology, Hefei Normal University, Hefei, China have published the research: Face Mask-Wearing Detection Model Based on Loss Function and Attention Mechanism, in the Journal: Computational Intelligence and Neuroscience of 12/07/2022
- what: By collecting 7 958 mask-wearing images and a large number of images of people without masks as a dataset and using YOLOv5s as the benchmark model the mAP of the model proposed in the paper reached 90.96% on the validation set which is significantly better than the . . .
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