HIGHLIGHTS
- who: Wanpei Yu and collaborators from the Institute of Manufacturing Engineering, Huaqiao University, Xiamen, China have published the paper: FDTD-Based Study on Equivalent Medium Approximation Model of Surface Roughness for Thin Films Characterization Using Spectroscopic Ellipsometry, in the Journal: Photonics 2022, 621 of 30/08/2022
- what: In this paper the influence of the surface topographical parameters on EMA model is analyzed. The authors provide convincing evidence indicating that the modeling ellipsometric parameters is more accurate and consistent with actual material surface topography with this relation, compared to the EMA model without EMA and . . .
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