HIGHLIGHTS
- who: Ruomeng Huang from the (UNIVERSITY) have published the article: Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition, in the Journal: (JOURNAL)
- what: The authors propose a novel supercycled ALD process for electrical properties tuning in undoped ZnO.
- how: X-ray photoelectron spectroscopy (XPS) data were obtained using a Thermo Scientific Theta Probe System with Al-Kα radiation (photon energy=1486.6 eV).
SUMMARY
The dominant way of tuning undoped ZnO film properties in the thermal ALD process is by changing the growth temperature. The authors . . .
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