HIGHLIGHTS
- who: Kwan Seob Park and colleagues from the Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland, USA have published the research: High numerical aperture reflective deep ultraviolet Fourier ptychographic microscopy for nanofeature imaging, in the Journal: (JOURNAL)
- what: The authors report a reflective deep ultraviolet (DUV) FPM featured by an aperture scanning illumination based on the epi-illumination scheme for accommodating a 193 nm excimer laser source and a high numerical aperture (NA) catadioptric objective lens.
- how: The optics used for the ArF excimer laser light (193.3 nm wavelength . . .
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