High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field

HIGHLIGHTS

• who: X. Wen from the SchoolPurdue University of Science and Technology of China, Hefei, Anhui, China have published the research work: High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field, in the Journal: Scientific Reports Scientific Reports
• what: The authors report the recent experimental advances in achieving massively parallel near-field maskless optical lithography with diffraction-unlimited resolutions. All the AFM topographical images in this work have been taken in the contact mode with a Bruker ORC8-10 AFM probe with a nominal tip radius of 15 nm . . .
  

   

  

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