HIGHLIGHTS
- who: Tanguy Lévéder and collaborators from the ChaixImpact of planarization sheet addition full wafer printing uniformityMRS Online Proceedings Library, Cambridge University CEALETI, Minatec, rue martyrs, Grenoble, France have published the article: Impact of planarization sheet addition on full wafer printing uniformity, in the Journal: (JOURNAL)
- what: It has been shown that usual intuitive experimental cleverness used in NanoImprint Lithography could be highly pertinent, powerful, and cost effective.
SUMMARY
B a c Figure 1: sketch of considered imprint stack. The reference configuration (a) without any soft layer is compared with . . .
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