HIGHLIGHTS
- What: The authors report the effects of different pulse widths on the current waveform and plasma spectrum of target material sputtering as well as the structure and properties of films prepared under the same sputtering voltage and duty cycle. This study investigated the effects of HiPIMS power supply parameters compared them with coppershear filmsstrength prepared DCMS.
- Who: Xincheng Liu et al. from the School of Materials Science and Engineering, Harbin Institute of Technology (Shenzhen), Shenzhen , have published the research: Influence of HiPIMS Pulse Widths on the Structure and Properties of Copper Films, in the Journal . . .
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