HIGHLIGHTS
SUMMARY
To overcome the drawbacks of the conventional m-SPL techniques, the authors have already proposed a new AFMbased nanolithography technique, termed Pulse-Atomic Force Lithography (P-AFL), as an evolution of AFM nanoindentation. The quality of the patterned nanostructures and the reproducibility of the proposed nanolithography process depend on values set for the main pulse-AFL parameters: the pulse amplitude (setpoint), the pulse width, and distance between following indentations (step). The topographic AFM images, the measurement of the force acting on the tip during lithography by force-spectroscopy, and all the nanolithography tests were . . .
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