Massively parallel direct writing of nanoapertures using multi-optical probes and super-resolution near-fields

HIGHLIGHTS

• who: Changsu Park from the To verify the nanoapertures fabricated using this massively parallel direct-writing system, we created a large-area (, u00d7 , mm) photoresist pattern through near-field lithography using an i-line commercial photolithography system (Fig4a, b). To determine pattern uniformity, we analyzed , parts of the total pattern area via high-resolution scanning electron microscopy. The mean line width of the nanopatterns wasnm, standard deviation wasnm and the uniformity (2u03c3) was, .22% (Fig., b, c and Table, ). To verify the application of the massively parallel direct-writing system, nanoapertures forming the eagle symbol of Yonsei . . .
  

   

  

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