Mechanical removal of surface residues on graphene for tem characterizations

HIGHLIGHTS

  • who: Dong-Gyu Kim from the (UNIVERSITY) have published the article: Mechanical removal of surface residues on graphene for TEM characterizations, in the Journal: (JOURNAL)
  • what: The authors explored the use of atomic force (AFM) to remove surface residues from 2D crystals.
  • how: The authors believe that the mechanical cleaning process can be utilized to prepare high-quality 2D crystal samples with minimum surface residues.

SUMMARY

    Reactivity are not generally compatible with these process. The mechanical cleaning process has potential to remove residues on wide range of 2D crystals . . .

     

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