Nanostructural, chemical, and mechanical features of nc-si:h films prepared by pecvd

HIGHLIGHTS

• who: Jong-Ick Son and colleagues from the Department of Materials Science and Engineering, Inha University, Incheon, Republic of Korea have published the research: Nanostructural, Chemical, and Mechanical Features of nc-Si:H Films Prepared by PECVD, in the Journal: (JOURNAL) of 29/08/2011
• what: Received 29 August 2011; Revised 26 November 2011; Accepted 5 January 2012 This study examined the effects of film thickness on the nanostructural chemical and mechanical features of nc-Si:H films deposited by plasma-enhanced chemical vapor deposition.

SUMMARY

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