HIGHLIGHTS
- who: Jiho Kim from the Pohang Accelerator Laboratory, POSTECH, Pohang, Republic of Korea Division of Materials Science and Engineering, Hanyang University, Seoul, Republic of Korea Full list of author information is available at the end of the article , have published the research work: Near-field infrared nanoscopic study of EUV- and e-beam-exposed hydrogen silsesquioxane photoresist, in the Journal: (JOURNAL)
- how: This Article presents a technique of scanning near-field optical microscopy (s-SNOM) based on scanu2011 ning probe microscopy as a nanoscale-resolution technique of the structural changes in phou2011 toresist thin films . . .
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