Nonlinear modeling of contact stress distribution in thin plate substrates subjected to aspect ratio

HIGHLIGHTS

• who: Chao Lv and collaborators from the Institute of Engineering Mechanics, Nanchang University, Nanchang, China have published the research: Nonlinear Modeling of Contact Stress Distribution in Thin Plate Substrates Subjected to Aspect Ratio, in the Journal: Sensors 2023, 4050 of /2023/
• what: This study examines the nonlinear distribution law of basal contact stresses in thin plates with various aspect ratios under concentrated loading and it establishes a model for the distribution of contact stresses in thin plates using an exponential function that accounts for aspect ratio coefficients. The results of the study have important theoretical . . .
  

   

  

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