HIGHLIGHTS
- who: Tanguy Lévéder and collaborators from the CEA Leti-Minatec , martyrs, Grenoble, France have published the Article: Optimization of demolding temperature for throughput improvement of nanoimprint lithography, in the Journal: (JOURNAL)
- what: Carry out a demolding at imprint temperature may imply a loss of pattern quality.
SUMMARY
The international technology roadmap for semiconductor (ITRS) trends predicts constant diminution of the features width and improvement of their quality. The main issue of quasi constant temperature imprint is to keep a good pattern quality, despite of high temperature demolding. Impact of . . .
If you want to have access to all the content you need to log in!
Thanks :)
If you don't have an account, you can create one here.