Origin of enhanced thermal atomic layer etching of amorphous hfo2

HIGHLIGHTS

• who: Rita Mullins and collaborators from the Tyndall National Institute, University College Cork, Cork , R CP, Ireland Barcelona Supercomputing Center (BSC), C/Jordi Girona, Barcelona, Spain have published the paper: Origin of enhanced thermal atomic layer etching of amorphous HfO2, in the Journal: (JOURNAL)
• what: This study examines the HF pulse on amorphous HfO2 using first-principles simulations. The surface fluorination step in thermal ALE using HF is the focus of the work and the focus of this paper. Analysis, the authors predict a theoretical etch rate based on the maximum possible coverage of surface . . .
  

   

  

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