Pattern reconstructability in fully parallel thinning

HIGHLIGHTS

• who: Firstname Lastname and colleagues from the Department of Electrical Engineering, Yuan Ze University, Chungli, Taoyuan, Taiwan have published the article: Pattern Reconstructability in Fully Parallel Thinning, in the Journal: (JOURNAL)
• how: In the phase of pattern reconstruction the reconstructed results are shown in Figure 12c (MR=0.817) and Figure 12d (MR=0.994) respectively. Of some patterns from the MPEG7 CE-Shape-1 dataset are obtained by the three fully-parallel thinning algorithms involved in this approach without the RHDP process for comparisons.
• future: It can be regarded as a new . . .
  

   

  

  If you want to have access to all the content you need to log in!

  Thanks :)

  Username or Email

  Password

  Remember me

  Lost your password?

  If you don't have an account, you can create one here.