Polishing approaches at atomic and close-to-atomic scale

HIGHLIGHTS

• who: Zhichao Geng and collaborators from the Centre of Micro/Nano, University College, (MNMT), Tianjin University, Tianjin, China have published the article: Polishing Approaches at Atomic and Close-to-Atomic Scale, in the Journal: Micromachines 2023, 343 of /2023/
• what: This model provides the following insights into the BP process: This model provides the insights into u03b7the BP process: Material Roughness (nm) Year BK7 Nickel-coated aluminum Stavax stainless steel Electroless nickel Aluminum alloy Ra 0.5 Ra 1 Ra 1 Ra 0.316 RMS 0.58 2002 2003 2003 2019 2019 However, BP has . . .
  

   

  

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