Quantification of area-selective deposition on nanometer-scale patterns using rutherford backscattering spectrometry

HIGHLIGHTS

• who: Niels Claessens from the (UNIVERSITY) have published the Article: Quantification of area-selective deposition on nanometer-scale patterns using Rutherford backscattering spectrometry, in the Journal: Scientific Reports Scientific Reports
• what: In Fig 2a the authors show a Rutherford backscattering spectrum obtained on the nanostructures treated with DMA-TMS and followed by 300 s Ru deposition, which is the sample shown in Fig 1b. The studies have also shown that the silicon signal originating from the oxide lines appears at 1.15 MeV, where it overlaps with the titanium signal.

SUMMARY

 



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