HIGHLIGHTS
- who: Submitted et al. from the Department of Electronics and Nanoengineering, Aalto University, Tietotie, Espoo, Finland School of Photovoltaic and Renewable Energy Engineering, University of New South Wales, Sydney, Australia , have published the Article: Rapid thermal anneal activates light induced degradation due to copper redistribution, in the Journal: (JOURNAL) of 18/07/2018
- what: The authors show experimentally that a typical rapid thermal anneal (RTA, a few seconds at 800 C) used commonly in the semiconductor and photovoltaic industries is sufficient to release a significant amount of Cu species from the phosphorus-doped layer to . . .
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