Remote-plasma-assisted deposition of pentacene layer using atomic-hydrogen

HIGHLIGHTS

• who: Satoshi Yamauchi and colleagues from the Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan have published the article: Remote-Plasma-Assisted Deposition of Pentacene Layer Using Atomic-Hydrogen, in the Journal: (JOURNAL)
• what: The authors demonstrate remote-plasma-assisted deposition (RPAD) of pentacene using hydrogen-gas plasma to improve the crystallographic feature comparJCPT ing to that by non-excited hydrogen gas induced vacuum evaporation (H2-VE). The results in this work show not only such growth condition but also the hydrogen ambient strongly influences to control the crystallized phase with the grain structure . . .
  

   

  

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