HIGHLIGHTS
- who: (C) et al. from the Laboratoire Chronombtrie, Electronique Pibzoblectricitb, Ecole Nationale , Besancon , France have published the research: Reprints available directly from the publisher Photocopying permitted by license only (C) (Overseas Association) Printed in Singapore, in the Journal: (JOURNAL)
- what: Changes in etch rate and in geometrical features of etched {hk0} surfaces are extensively studied and then compared with results related to other etchants (KOH 35%, TMAH 25%).
SUMMARY
Various {hk0} plates suffer successive isotherral etchings at 80 4- 0.5C in the two other etchants (35% KOH-water and 25 . . .
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