Rf sputtering, post-annealing treatment and characterizations of zno (002) thin films on 3c-sic (111)/si (111) substrates

HIGHLIGHTS

• who: Visakh Valliyil Sasi and collaborators from the Centre, Griffith University, Nathan, Australia have published the Article: RF Sputtering, Post-Annealing Treatment and Characterizations of ZnO (002) Thin Films on 3C-SiC (111)/Si (111) Substrates, in the Journal: Micromachines 2016, 7, x FOR PEER REVIEW of /2016/
• what: The authors report on the radio frequency (RF) sputtering of c-axis oriented ZnO thin films on top of epitaxial 3C-SiC-on-Si which were then subjected to post-annealing treatment at and ◦ C. Grazing incident X-ray Diffraction (XRD) data show that the Full . . .
  

   

  

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