HIGHLIGHTS
- What: Meanwhile, the study introduces a novel method for controlling PMMA resist`s step height through binary lithography and reflow (BLR).
- Who: Joel K. W. Yang from the (UNIVERSITY) have published the article: Scaling up multispectral color filters with binary lithography and reflow (BLR), in the Journal: (JOURNAL)
SUMMARY
A grayscale stencil lithography process was used - M. A. Rahman et_al: Multispectral color filters with binary lithography and reflow to control the thickness of the dielectric layer of the F-P cavity structure by tilting (precessing) a shadow mask array of holes . . .
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