HIGHLIGHTS
- who: Ankush Oberai and Jiann-Shiun Yuan from the Synopsys, Mountain View, CA, USA Department of Electrical and Computer Engineering, University of Central Florida, Orlando, FL, USA have published the Article: Smart E-Beam for Defect Identification & Analysis in the Nanoscale Technology Nodes: Technical Perspectives, in the Journal: (JOURNAL)
- what: With the motivation of low nanometer inspection, this study aims to highlight the strong need of EBI, mainly focusing on nodes at 10 nm and even below. The aim is to understand what type of signal different shorts provided. The encouraging results of this research . . .
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