HIGHLIGHTS
- who: Daniel Schmidt and collaborators from the IBM Research, Albany, New York, United States have published the paper: Spectral interferometry for fully integrated device metrology, in the Journal: (JOURNAL) of 14/03/2023
- what: In this paper, scatterometry challenges are discussed, and one approach that helps to overcome some of the shortcomings of the model-based optical technique is presented in more detail. Different CMP process conditions do not lead to a constant offset between the two measured targets, which is the main reason why in-die measurements are key for successful in-line process . . .
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