Stoichiometry and morphology analysis of thermally deposited v2o5-x thin films for si/v2o5-x heterojunction solar cell applications

HIGHLIGHTS

  • who: Gwan Seung Jeong et al. from the Department of Metallurgical Engineering, Dong-A University, Busan, Korea have published the research work: Stoichiometry and Morphology Analysis of Thermally Deposited V2O5-x Thin Films for Si/V2O5-x Heterojunction Solar Cell Applications, in the Journal: Materials 2022, 5243 of 29/07/2022
  • what: The authors report the effect of the substrate temperature for the deposition of vanadium oxide (V2 0 ≤ ≤ 5) films (TFs) for enhanced Si surface passivation.
  • how: To confirm this assumpassumption additional XPS measurements were performed to investigate the stoichiometry tion XPS . . .

     

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