HIGHLIGHTS
- who: Jiri Hlina and colleagues from the Department of Materials and Technology, Faculty of Electrical Engineering, University of West Bohemia have published the paper: Study of Internal Stress in Conductive and Dielectric Thick Films, in the Journal: Materials 2022, 8686 of /2022/
- what: The main reason for the measurement of internal stress in thin films is the possibility of significant defect formation due to high internal stress in the range of GPa and the fact that the inner structure of thin films is much more homogeneous compared to that of thick films, which contain more . . .
If you want to have access to all the content you need to log in!
Thanks :)
If you don't have an account, you can create one here.