Surface characterization of imprinted resist during demolding above glass transition temperature

HIGHLIGHTS

  • who: Tanguy Lévéder et al. from the Institut LETI-Minatec, Rue des Martyrs, Grenoble, France have published the research: Surface characterization of imprinted resist during demolding above glass transition temperature, in the Journal: (JOURNAL) of 10/02/2020
  • what: The authors focus onto the resist relaxation scheme when demolding processes may be performed above or below the glass transition temperature 共Tg兲 of the resist to reduce the cooling time of the whole imprint setup. Following the approach proposed by Hamdorf and Johannsmann the viscosity of the film may be estimated from the relation . . .

     

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